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Single-Layer MoS2 Field Effect Transistor with Epitaxially Grown SrTiO3 Gate Dielectric on Nb-doped SrTiO3 Substrate

  • Kim, Woo-Hee (Process Development Team, System LSI Division, Samsung Electronics) ;
  • Son, Jong Yeog (Department of Applied Physics, Kyung Hee University)
  • Received : 2013.04.24
  • Accepted : 2013.06.10
  • Published : 2013.09.20

Abstract

Keywords

References

  1. Novoselov, K. S.; Geim, A. K.; Morozov, S. V.; Jiang, D.; Grigorieva, M. I. K. I. V.; Dubonos, S. V.; Firsov, A. A. Nature 2005, 438, 197. https://doi.org/10.1038/nature04233
  2. Zhang, Y.; Tan, Y.-W.; Stormer, H. L.; Kim, P. Nature 2005, 438, 201. https://doi.org/10.1038/nature04235
  3. Ayari, A.; Cobas, E.; Ogundadegbe, O.; Fuhrer, M. S. J. of Appl. Phys. 2007, 101, 014507. https://doi.org/10.1063/1.2407388
  4. Radisavljevic, B.; Radenovic, A.; Brivio, J.; Giacometti, V.; Kis, A. Nat. Nanotechnol. 2011, 6, 147. https://doi.org/10.1038/nnano.2010.279
  5. Liu, H.; Neal, A. T.; Ye, P. D. ACS Nano 2012, 6, 8563. https://doi.org/10.1021/nn303513c
  6. Chen, Y. L.; Analytis, J. G.; Chu, J. H.; Liu, Z. K.; Mo, S. K.; Qi, X.-L.; Zhang, H. J.; Lu, D. H.; Dai, X.; Fang, Z. Science 2009, 325, 178. https://doi.org/10.1126/science.1173034
  7. Zhang, H.; Liu, C.-X.; Qi, X.-L.; Dai, X.; Fang, Z.; Zhang, S.-C. Nat. Phys. 2009, 5, 438. https://doi.org/10.1038/nphys1270
  8. Late, D. J.; Liu, B.; Matte, H. S. S. R.; Dravid, V. P.; Rao, C. N. R. ACS Nano 2012, 6, 5635. https://doi.org/10.1021/nn301572c
  9. Yoon, Y.; Ganapathi, K.; Salahuddin, S. Nano Lett. 2011, 11, 3768. https://doi.org/10.1021/nl2018178
  10. Liu, H.; Gu, J.; Ye, P. D. IEEE Electron Device Lett. 2012, 33, 1273. https://doi.org/10.1109/LED.2012.2202630
  11. Novoselov, K. S.; Jiang, D.; Schedin, F.; Booth, T. J.; Khotkevich, V. V.; Morozov, S. V.; Geim, A. K. Proc. Natl. Acad. Sci. U.S.A. 2005, 102, 10451. https://doi.org/10.1073/pnas.0502848102
  12. Liu, H.; Ye, P. D. IEEE Electron Device Lett. 2012, 33, 546. https://doi.org/10.1109/LED.2012.2184520
  13. Lembke, D.; Kis, A. ACS Nano 2012, 6, 10070. https://doi.org/10.1021/nn303772b
  14. Son, J. Y.; Shin, Y.-H.; Ryu, S.; Kim, H.; Jang, H. M. J. Am. Chem. Soc. 2009, 131, 14676. https://doi.org/10.1021/ja906871b
  15. Son, J. Y.; Shin, Y.-H.; Kim, H.; Jang, H. M. ACS Nano 2010, 4, 2655. https://doi.org/10.1021/nn100234x
  16. Lee, Y.-H.; Zhang, X.-Q.; Zhang, W.; Chang, M.-T.; Lin, C.-T.; Chang, K.-D.; Yu, Y.-C.; Wang, J. T.-W.; Chang, C.-S.; Li, L.-J.; Lin, T.-W. Adv. Mater. 2012, 24, 2320. https://doi.org/10.1002/adma.201104798
  17. Hong, X.; Posadas, A.; Zou, C. H.; Zhu, J. Phys. Rev. Lett. 2009, 102, 136808. https://doi.org/10.1103/PhysRevLett.102.136808
  18. Shin, Y.-S.; Son, J. Y.; Jo, M.-H.; Shin, Y.-H.; Jang, H. M. J. Am. Chem. Soc. 2011, 133, 5623. https://doi.org/10.1021/ja108464s

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