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HomeMaterials Science ForumMaterials Science Forum Vols. 717-720Plasma-Based Chemical Modification of Epitaxial...

Plasma-Based Chemical Modification of Epitaxial Graphene

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Abstract:

In this work, the treatment of epitaxial graphene on SiC using electron beam generated plasmas produced in mixtures of argon and oxygen is demonstrated. The treatment imparts oxygen functional groups on the surface with concentrations ranging up to about 12 at.%, depending on treatment parameters. Surface characterization of the functionalized graphene shows incorporation of oxygen to the lattice by disruption of ∏-bonds, and an altering of bulk electrical properties.

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Silicon Carbide and Related Materials 2011

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Periodical:

Materials Science Forum (Volumes 717-720)

Pages:

657-660

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.717-720.657

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Online since:

May 2012

Authors:

Scott G. Walton, Sandra C. Hernández, Mira Baraket, Virginia D. Wheeler, Luke O. Nyakiti, Rachael L. Myers-Ward, Charles R. Eddy, D. Kurt Gaskill

Keywords:

Epitaxial Graphene, Functionalization, Oxygen, Plasma

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