Paper Titles

3-D Static and Time-Depending Modelling of DC and RF Thermal Plasmas for Industrial Applications
p.1

Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition
p.11

A Comparison between Conventional Thermal Treatment and Excimer Laser Irradiation Performed on Alumina/PEEK Composite Coatings
p.17

Application of SEM/TEM to Tests on Pt Distribution in Al₂O₃ Films Obtained by Oxidising FeCrAl Steel Foil Coated with Pt-Al Nanofilms
p.23

A Chemometric Study of Alumina/PEEK and Hydroxyapatite/PEEK Suspensions Prepared for Electrophoretic Deposition of Multifunctional Coatings
p.29

Effect of Methane Flow Rate on the Microstructural and Mechanical Properties of Silicon Carbide Thin Films Deposited by Reactive DC Magnetron Sputtering
p.35

ESR Study of Elements Added-DLC Films Deposited by PBII and RF-CVD Methods
p.41

HomeAdvances in Science and TechnologyAdvances in Science and Technology Vol. 663-D Static and Time-Depending Modelling of DC and...

3-D Static and Time-Depending Modelling of DC and RF Thermal Plasmas for Industrial Applications

Article Preview

Abstract:

Thermal plasma processes play nowadays a key role in many industrial applications, such as powder densification and spheroidization, synthesis of nano-powders, treatment of waste materials and spraying of thin coatings. Although many of these applications have been fully implemented industrially for many decades, modelling plays an important factor in their continued development and improvement. 3-D simulation of the behaviour of commercial inductively coupled (RF) plasma can be useful tool to predict the main features of plasma assisted treating and processing of injected raw materials. The effects of changing coil current frequency, the hydrogen mixing in argon primary gas and the flow patterns and temperature distributions have been investigated. 3-D time-dependent modelling DC non-transferred arc plasma torch for plasma spraying operating at atmospheric pressure can allow the prediction of particle trajectories and thermal history, the analysis of the influence of the plasma jet cold gas entrained eddies on particle behaviour and the mechanisms that can lead to a fluctuating and non homogeneous heating of the particle stream. All computations have been performed using a customized version of the CFD commercial code FLUENT©.

You might also be interested in these eBooks

12th INTERNATIONAL CERAMICS CONGRESS PART E

Info:

Periodical:

Advances in Science and Technology (Volume 66)

Pages:

1-10

DOI:

https://doi.org/10.4028/www.scientific.net/AST.66.1

Citation:

Cite this paper

Online since:

October 2010

Authors:

Vittorio Colombo, Emanuele Ghedini, Paolo Sanibondi

Keywords:

DC Non-Transferred Arc Plasma Torch, Inductively Coupled Plasma Torch, Particle Treatment, Thermal Plasma

Export:

RIS, BibTeX

Price:

Permissions:

Request Permissions

[1] Pfender E 1999 Plasma Chem. Plasma Process. 19.

[2] Schiller G, Muller M and Gitzhofer F 1999 J. Therm. Spray 8 389-92.

[3] Shinoda K, Kojima Y and Yoshida T 2005 J. Therm. Spray Technol. 14 511-7.

[4] Karoly Z and Szepvolgyi J 2003 Powder Technology 132 211-15.

[5] Ye R, Ishigaki T, Jurewicz J, Proulx P and Boulos M I 2004 Plasma Chem. and Plasma Proces. 24 555-71.

[6] Colombo V, Ghedini E, Masini G, Russo D, Andreola F, Barbieri L, Belviso D, Lancellotti I and Pozzi P 2006 High Temp. Mater. Process. 20 207-18.

DOI: 10.1615/hightempmatproc.v10.i2.40

[7] Amouroux J, Morvan D, Cavadias S, Adam Ph, Gonnord M F, Coulibaly K, Vincent A, Morel S, Daou F, Ognier S, Rousseau P and Martin L 2005 Tech. Phys. 75 73-82.

[8] Heberlein J and Murphy A B 2008 J. Phys. D: Appl. Phys. 41 053001 (20pp).

[9] Guo J Y, Gitzhofer F and Boulos M I 1995 J. Mater. Sci. 30 5589-99.

[10] Siegmann S, Girshick S L, Szepvolgyi J, Leparoux M, Shin J W, Schreuders C, Rohr L, Ishigaki T, Jurewicz J W, Habib M, Baroud G, Gitzhofer F, Kambara M, Diaz J M A, Yoshida T 2008 High Temperature Material Processes 12 205-54.

DOI: 10.1615/hightempmatproc.v12.i3-4.20

[11] Boulos M I 1996 Pure Appl. Chem. 68 1007-10.

[12] Spores R and Pfender E 1989 Surf. Coat. Technol. 37 251.

[13] Fauchais P 2004 J. Phys. D: Appl. Phys. 37 (2004).

[14] Murphy A B, Boulos M I , Colombo V , Fauchais P, Ghedini E, Gleizes A, Mostaghimi J, Proulx P and Schram D C, 2008 High Temperature Material Processes 12 255-336.

DOI: 10.1615/hightempmatproc.v12.i3-4.30

[15] Reed T B 1961 J. Appl. Phys 32 821-4.

[16] Colombo V and Ghedini E 2005 Proceedings of 17th International Symposium on Plasma Chemistry (ISPC-17), Toronto, Canada. 7 - 12 August.

[17] Colombo V and Ghedini E 2007 Proceedings of 16th IEEE International Pulsed Power Conference (ICOPS 2007), Albuquerque, New Mexico, USA, 17 - 22 June.

[18] Trelles J P, Pfender E and Heberlein J V R 2006 Plasma Chem. Plasma Process. 26, 557–75.

[19] Shigeta M and Nishiyama H 2005 Int. J. Heat Mass Transfer 127 1222-30.

[20] Colombo V, Ghedini E and Sanibondi P, 2009 J. Phys. D: Appl. Phys. 42 055213 (12pp).

[21] Murphy A B 1993 Phys. Rev. E 48 3594.

[22] Murphy A B 2001 J. Phys. D: Appl. Phys. 34 R151.

[23] FLUENT 6. 3 User's Guide 2006, Fluent Inc. Centerra Resource Park 10 Cavendish Court, Lebanon, NH 03766.

[24] Colombo V, Ghedini E and Sanibondi P 2010 J. Phys. D: Appl. Phys. 43 105202 (13 pp).

[25] Bernardi D, Colombo V, Ghedini E, Mentrelli A and Trombetti T 2004 Eur. J. Phys. D 28 423.

[26] Proulx P, Mostaghimi J and Boulos M I 1987 Plasma Chem. Plasma Process. 7.