Microstructure and Oxidation Resistance of TiN Coatings

Guo Zheng Nie; Chun Liang Zhong; Lan E Luo; Ren Long Zhou; Qiang Liu

doi:10.4028/www.scientific.net/AMR.750-752.2092

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 750-752Microstructure and Oxidation Resistance of TiN...

Microstructure and Oxidation Resistance of TiN Coatings

Abstract:

A series of TiN coatings were deposited by reactive magnetron sputtering with different target powers and different N₂ flows. The microstructure and oxidation resistance of TiN coatings were characterized by X-ray diffraction (XRD). The hardness of the thin films was characterized respectively with the nanoindentor. The effect of target powers and the N₂ flows on the microstructure, the hardness and oxidation resistance was studied. It was found that TiN coating deposited at different target powers and different N₂ flows exhibits a cubic structure with (1 1 1) preferred orientations, and the hardness of TiN coatings is 1200. The oxidation resistance of the TiN coatings is approximately 500°C.

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Periodical:

Advanced Materials Research (Volumes 750-752)

Pages:

2092-2095

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.750-752.2092

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Online since:

August 2013

Authors:

Guo Zheng Nie*, Chun Liang Zhong, Lan E Luo, Ren Long Zhou, Qiang Liu

Keywords:

Hardness, Magnetron Sputtering, Oxidation Resistance, TiN Coating

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