Design of Double-Sided Polishing Machine for Functional Crystal Substrate

Jin Shuang Yang; Xiang Long Zhu; Zhi Gang Dong; Ren Ke Kang; Dong Ming Guo; Bi Zhang

doi:10.4028/www.scientific.net/AMR.1017.580

Paper Titles

Micro-Cracks Removal on Edge Surface of Thin Glass Sheet Using Magnetorheological Finishing
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Study on the Flow Pressure of Mass in Centrifugal Disc Finishing
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Research on Performance of Fixed Abrasive Tools of Polishing 6H-SiC Wafers
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Conditioning of Vitrified Bond CBN Grinding Wheels Using a Picosecond Laser
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Design of Double-Sided Polishing Machine for Functional Crystal Substrate
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Development of Non-Contact Classifying Systems by Use of Acoustic Levitation
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Computer-Aided Simulation of Dressing Using Diamond Rotary Dresser and Visualization of Dressing Process
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Simulation of Chip Formation Behavior during Single Diamond Grains Grinding by CEL Method
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Development of Rotary Work Table with Constant-Flow Hydrostatic Water Bearing for Large Scale Silicon-Wafer Grinding Machine
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1017Design of Double-Sided Polishing Machine for...

Design of Double-Sided Polishing Machine for Functional Crystal Substrate

Abstract:

Responding to the demand on the ultra-precision equipment for machining monocrystalline silicon, sapphire, zirconia ceramics and other large-size functional crystal substrates in the microelectronics and optoelectronics manufacturing, this study analyzes the current state-of-the-art of polishing technologies and the technical challenges to achieving high surface quality substrates. In this study, a planetary double-sided polishing machine is designed to solve the problem between achieving high polishing quality and efficiency. The machine is characterized by process stability, large polishing pressure and high polishing speed, etc. which is verified by polishing zirconia substrates with satisfactory results: material removal rate of 5 μm/h and the surface roughness Ra of 1 nm.

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Periodical:

Advanced Materials Research (Volume 1017)

Pages:

580-585

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1017.580

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Online since:

September 2014

Authors:

Jin Shuang Yang, Xiang Long Zhu, Zhi Gang Dong, Ren Ke Kang*, Dong Ming Guo, Bi Zhang

Keywords:

Design, Double-Sided Polishing, Planetary Motion, Substrate, Ultra-Precision Machine

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* - Corresponding Author

References

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