Preparation and Characteristics of the Ag/SiO2 Nanocomposite Prepared by Magnetron Sputtering and ICP Plasma

Li Jun Sang; Hui Qin Zhu; Fen Ce Chen; Qiang Chen

doi:10.4028/www.scientific.net/AMM.711.143

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 711Preparation and Characteristics of the Ag/SiO2...

Preparation and Characteristics of the Ag/SiO₂ Nanocomposite Prepared by Magnetron Sputtering and ICP Plasma

Abstract:

Ag/SiO_X nanocomposites were successfully fabricated by inductively coupled plasma (ICP) enhanced magnetron sputtering plasma where the hexamethyldisiloxane (HMDSO) was as the monomer for SiOx deposition and Ag nanoparticles were sputtered by Ar ions from Ag target. The main motivation of this work is to clarify the feasibility of Ag/SiO_X nanocomposite fabrication in a simultaneous process with plasma technology. Besides the influence of processing parameters on the microstructures and properties of the nanocomposite, such as ICP power, the deposition time and ratio of HMDSO and Argon, is investigated in this paper. With Fourier transform infrared spectroscopy (FTIR), ultraviolet visible spectroscopy (UV-Visible), and atomic force micrograph (AFM) the microstructures of the Ag/SiO_X nanocomposite were characterized. It is founded that the microstructures and properties of nanocomposite depend on the discharge parameters. As an application the antibacterial behavior was tested. It indicates that the Ag/SiOx nanocomposites demonstrate an excellent antibiotic effect to colon bacillus and golden brown staphylococcus. It concludes that the Ag/SiO_X nanocomposite can be facilely prepared by this processing.

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Periodical:

Applied Mechanics and Materials (Volume 711)

Pages:

143-148

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.711.143

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Online since:

December 2014

Authors:

Li Jun Sang*, Hui Qin Zhu, Fen Ce Chen, Qiang Chen

Keywords:

Ag/SiO_X, Magnetron Sputtering, Nanocomposite, Plasma

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