日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
巨大磁気抵抗効果・トンネル磁気抵抗効果(GMR・TMR)
集束イオンビーム加工によるCo-Al-Oグラニュラー細線の作製と磁気抵抗効果
薬師寺 啓三谷 誠司高橋 法男高梨 弘毅藤森 啓安
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ジャーナル オープンアクセス

2000 年 24 巻 4_2 号 p. 567-570

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Submicron-size wires of Co-Al-O granular film were fabricated using a gallium focused ion beam, and the magnetoresistance (MR) of the wires was investigated. Bias voltage dependence of the MR for Co-Al-O films was measured up to 60 mV utilizing a wire geometry with cross-sectional area of 100×100 nm2 and length of 500 nm. MR is constant in the range of Vb = 0 to 60 mV at 77 K, where Vb is defined as the bias voltage between two neighboring Co granules in the wire, but the MR magnitude is slightly smaller than that before fabrication by the focused ion beam. The decrease in MR is thought to be caused by an irradiation effect of high-energy gallium ions.

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© 2000 (社)日本応用磁気学会
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