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Silicon diffractive optical elements for high-power monochromatic terahertz radiation

  • Physical and Engineering Fundamentals of Microelectronics and Optoelectronics
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Optoelectronics, Instrumentation and Data Processing Aims and scope

Abstract

This paper presents a fabrication technique and results of studies of silicon binary diffractive optical elements (DOEs): a diffractive lens and a 1 : 2 diffractive beam splitter with an aperture diameter of 30 mm for the terahertz spectral range. The elements were fabricated in two versions: with and without an antireflection coating of parylene C. The DOE characteristics were investigated in the beam of the Novosibirsk free electron laser at a wavelength of 141 μm. The results are given of a study of the radiation resistance of the coating, which remained intact upon exposure to an average radiation power density of 4 kW/cm2; the peak power in a 100 ps pulse was almost 8 MW/cm2. Experimental estimates of the diffraction efficiency of the elements coated with the antireflection coating are in good agreement with theoretical estimates.

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Correspondence to B. A. Knyazev.

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Original Russian Text © A.N. Agafonov, B.O. Volodkin, A.K. Kaveev, B.A. Knyazev, G.I. Kropotov, V.S. Pavel’ev, V.A. Soifer, K.N. Tukmakov, E.V. Tsygankova, Yu.Yu. Choporova, 2013, published in Avtometriya, 2013, Vol. 49, No. 2, pp. 98–105.

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Agafonov, A.N., Volodkin, B.O., Kaveev, A.K. et al. Silicon diffractive optical elements for high-power monochromatic terahertz radiation. Optoelectron.Instrument.Proc. 49, 189–195 (2013). https://doi.org/10.3103/S875669901302012X

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  • DOI: https://doi.org/10.3103/S875669901302012X

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