Synthesis of Poly(3-butylthiophene) with Trisiloxane End Group and Its Surface Segregation Behavior in Thin Films

Fanji Wang; Kazuhito Hashimoto; Hiroshi Segawa; Keisuke Tajima

doi:10.2494/photopolymer.31.151

Fanji Wang, Kazuhito Hashimoto, Hiroshi Segawa, Keisuke Tajima

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Keywords: Thin films, Semiconducting polymers, End-group functionalization, Low surface energy, Surface segregated monolayer, Trisiloxane

JOURNAL FREE ACCESS

2018 Volume 31 Issue 2 Pages 151-156

DOI https://doi.org/10.2494/photopolymer.31.151

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Abstract

A poly(3-butylthiophene) derivative with an end group of 1,1,1,3,3,5,5-heptamethyl trisiloxane group (P3BT-Si) was synthesized for the application to surface segregated monolayer (SSM) in polymer films. The surface segregation behaviors, thermal properties and chain orientation of P3BT-Si were investigated. The formation of the surface layer of P3BT-Si was confirmed in the blend films with polystyrene. In contrast to the fluoroalkyl-terminated polymer (P3BT-F₁₇) that shows strong end-on orientation in the SSM with high crystallinity, P3BT-Si showed edge-on orientation in the SSM with low crystallinity. The difference can be attributed to the more flexible structure of trisiloxane group than the fluoroalkyl chain.

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