Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Development of Environmental Harmony Resist Removal System using Cryogenic Particulate Spray
Jun IshimotoHideo Horibe
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2015 Volume 28 Issue 2 Pages 285-288

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Abstract

It is numerically found that the atomization of LN2 droplet is induced by shear flow between LN2 and gaseous nitrogen (GN2) flow. Sequentially, liquid to solid phase change is enhanced and solid nitrogen (SN2) particle is continuously created by LN2 droplet freezing. By using ToF-SIMS and XPS analysis for resist removal experiment, the obtained C film thickness of resist removal section is 0.2 nm. Therefore, the photo resist can be successfully removed by using cryogenic solid particulate spray method.

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© 2015 The Society of Photopolymer Science and Technology (SPST)
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