Simple Monitoring of Discharge State in Inductively Coupled Plasma Using Radio Frequency Impedance Analyzer

Kikuko Yoshimura; Shinji Nakagami; Takeshi Minaguchi; Hirohiko Nakano; Toshiaki Tatsuta; Osamu Tsuji

doi:10.2494/photopolymer.15.283

Kikuko Yoshimura, Shinji Nakagami, Takeshi Minaguchi, Hirohiko Nakano, Toshiaki Tatsuta, Osamu Tsuji

Author information

Keywords: inductively coupled plasma, monitoring of plasma discharge state, radio frequency impedance analyzer, plasma density, skin effect of plasma discharge

JOURNAL FREE ACCESS

2002 Volume 15 Issue 2 Pages 283-290

DOI https://doi.org/10.2494/photopolymer.15.283

Details

Abstract

Changes of discharge state in inductively coupled plasma (ICP) were investigated by use of a radio frequency (RF) impedance analyzer. A voltage loaded on the ICP coil and a current flowing within the coil were plotted against the RF power, and the two curves exhibited similar patterns. The discharge states, i.e., the E mode, the H mode, and an appearance of the skin effect were inferred from the curves and a theoretical interpretation by use of a circuit model. The inference was also supported by curves of a real part of load impedance and of a load impedance phase angle versus the power.

Corresponding author

Register with J-STAGE for free!