1995 年 44 巻 501 号 p. 705-709
The symmetric gradient materials of MoSi2/Al2O3/Ni/Al2O3/MoSi2 were fabricated by SHS/HIP compaction. Due to the thermal expansion mismatch between the outer MoSi2 and inner Al2O3-Ni layers, the compressive residual stress as much as 100MPa was induced in the MoSi2 surface, which enhanced the toughness to 5.8MPa·m1/2 comparing to 3.8MPa·m1/2 of the monolithic MoSi2. The flexural strength of the FGMs was 580MPa which is slightly higher than the monolithic MoSi2. It was found that Al2O3 in the FGMs acted as a diffusion barrier to Ni even under heat treatment at 900°C for 8hr.