New photolithography stepping machine
- Lawrence Livermore National Lab., CA (United States)
- Ultratech Stepper Inc. (United States)
A joint development project to design a new photolithography steeping machine capable of 150 nanometer overlay accuracy was completed by Ultratech Stepper and the Lawrence Livermore National Laboratory. The principal result of the project is a next-generation product that will strengthen the US position in step-and-repeat photolithography. The significant challenges addressed and solved in the project are the subject of this report. Design methods and new devices that have broader application to precision machine design are presented in greater detail while project specific information serves primarily as background and motivation.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 97300
- Report Number(s):
- UCRL-ID-120313; LLNL-99020609; ON: DE95015879; CRN: C/LLNL--TSB-842-94
- Resource Relation:
- Other Information: PBD: 8 Mar 1995
- Country of Publication:
- United States
- Language:
- English
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