Modeling Laser Effects on the Final Optics in Simulated IFE Environments
When laser light interacts with a material's surface, photons rapidly heat the electronic system, resulting in very fast energy transfer to the underlying atomic crystal structure. The intense rate of energy deposition in the shallow sub-surface layer creates atomic defects, which alter the optical characteristics of the surface itself. In addition, the small fraction of energy absorbed in the mirror leads to its global deformation by thermal and gravity loads (especially for large surface area mirrors). The aim of this research was to model the deformation of mirror surfaces at multiple length and time scales for applications in advanced Inertial Fusion Energy (IFE) systems. The goal is to control micro- and macro-deformations by material system and structural design. A parallel experimental program at UCSD has been set up to validate the modeling efforts. The main objective of the research program was to develop computer models and simulations for Laser-Induced Damage (LID) in reflective and transmissive final optical elements in IFE laser-based systems. A range of materials and material concepts were investigated and verified by experiments at UCSD. Four different classes of materials were considered: (1) High-reflectivity FCC metals (e.g. Cu, Au, Ag, and Al), (2) BCC metals (e.g. Mo, Ta and W), (3) Advanced material concepts (e.g. functionally graded material systems, amorphous coatings, and layered structures), and (4) Transmissive dielectrics (e.g. fused SiO2). In this report, we give a summary of the three-year project, followed by details in three areas: (1) Characterization of laser-induced damage; (2) Theory development for LIDT; and (3) Design of IFE reflective laser mirrors.
- Research Organization:
- Univ. of California, Los Angeles, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- FG03-00ER54594
- OSTI ID:
- 841807
- Country of Publication:
- United States
- Language:
- English
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