Title |
Ionization Profile Monitor Simulations - Status and Future Plans |
Authors |
- M. Sapinski, P. Forckpresenter, T. Giacomini, R. Singh, S. Udrea, D.M. Vilsmeier
GSI, Darmstadt, Germany
- F. Belloni, J. Marroncle
CEA/IRFU, Gif-sur-Yvette, France
- B. Dehning, J.W. Storey
CERN, Geneva, Switzerland
- K. Satou
J-PARC, KEK & JAEA, Ibaraki-ken, Japan
- C.A. Thomas
ESS, Lund, Sweden
- R.M. Thurman-Keup
Fermilab, Batavia, Illinois, USA
- C.C. Wilcox, R.E. Williamson
STFC/RAL/ISIS, Chilton, Didcot, Oxon, United Kingdom
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Abstract |
Nonuniformities of the extraction fields, the velocity distribution of electrons from ionization processes and strong bunch fields are just a few of the effects affecting Ionization Profile Monitor measurements and operation. Careful analysis of these phenomena require specialized simulation programs. A handful of such codes has been written independently by various researchers over the recent years, showing an important demand for this type of study. In this paper we describe the available codes and discuss various approaches to Ionization Profile Monitor simulations. We propose benchmark conditions to compare these codes between themselves and we collect data from various devices to benchmark codes against the measurements. Finally we present a community effort with a goal to discuss the codes, exchange simulation results and to develop and maintain a new, common codebase.
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Paper |
download TUPG71.PDF [0.212 MB / 4 pages] |
Conference |
IBIC2016, Barcelona, Spain |
Series |
International Beam Instrumentation Conference (5th) |
Proceedings |
Link to full IBIC2016 Proccedings |
Session |
Tuesday Poster Session |
Date |
13-Sep-16 16:00–18:00 |
Main Classification |
Transverse Profile Monitors |
Keywords |
simulation, electron, ion, detector, space-charge |
Publisher |
JACoW, Geneva, Switzerland |
Editors |
Isidre Costa (ALBA-CELLS, Barcelona, Spain); Ubaldo Iriso (ALBA-CELLS, Barcelona, Spain); Francis PĂ©rez (ALBA-CELLS, Barcelona, Spain); Volker RW Schaa (GSI, Darmstadt, Germany) |
ISBN |
978-3-95450-177-9 |
Published |
February 2017 |
Copyright |
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