Abstract
It has recently been shown that the front surface region of the silicon lattice is severely strained during pulsed laser irradiation. This uniaxial strain reduces the symmetry of the front surface region, resulting in additional shifts and splittings of the phonon frequency and changes in the Raman scattering tensor. It is shown that, for the case of pulsed laser irradiation, the phonon frequency is increased, and the 3-fold degenerate optical phonon is split into a singlet and a doublet. The changes in the Raman scattering tensor make it non-symmetric, and generally invalidate the technique used by Compaan et al. to determine the cross section experimentally. The complications introduced by the presence of stress during pulsed laser annealing, coupled with the temperature dependence of the optical and Raman tensors, make a simple interpretation of the Stokes to anti-Stokes ratio in terms of lattice temperature extremely unreliable.
Similar content being viewed by others
References
“Laser-Solid Interactions and Transient Thermal Processing of Materials,” Materials Research Society Symposia Proceedings, Vol 13, J. Narayan, W. L. Brown, and R. A. Lemons, eds. (North-Holland, New York, 1983).
R. F. Wood and G. E. Giles, Phys. Rev. B 23, 2923 (1981).
A. Compaan, H. W. Lo, A. Aydinli, and M. C. Lee, Ref. 1, p. 23.
D. von der Linde, G. Wartmann, and A. Ozols, Ref. 1, p. 17.
G. E. Jellison, Jr., D. H. Lowndes, and R. F. Wood, Ref. 1, p. 35.
G. E. Jellison, Jr., D. H. Lowndes, and R. F. Wood, Phys. Rev. B 28, 3272 (1983), G. E. Jellison, Jr. and F. A. Modine, Phys. Rev. B 27, 7466 (1983), G. E. Jellison, Jr. and F. A. Modine, Appl. Phys. Lett. 41, 180 (1982), and A. Compaan and H. J. Trodahl (submitted to Phys. Rev. B).
R. F. Wood, D. H. Lowndes, G. E. Jellison, Jr., and F. A. Modine, Appl. Phys. Lett. 41, 287 (1982).
B. C. Larson, C. W. White, T. S. Noggle, J. F. Barhorst, and D. Mills, Appl. Phys. Lett. 42, 282 (1983).
E. Anastassakis, A. Pinczuk, E. Burstein, F. H. Pollak, and M. Cardona, Solid State Comm. 8, 133 (1970).
H. B. Huntington in Solid State Physics, volume 7 (Academic Press, New York, 1958), p. 213.
H. Metzger and F. R. Kessler, Zeit. fur Natur. 25a, 904 (1970); A. G. Beattie and J. E. Schirber, Phys. Rev. B 1, 1548 (1970).
R. W. Vook and F. Witt, J. Appl. Phys. 36, 2169 (1965).
M. Balkanski, R. F. Wallis, and E. Haro, Phys. Rev. B 28, 1928 (1983).
“Thermophysical Properties of Matter, Vol. 13: Thermal Expansion,” edited by Y. S. Touloukian (IFI/Plenum Press, New York), p. 154.
H. Wendel, Solid State Comm. 31, 423 (1979).
K. Kondo and A. Moritani, Phys. Rev. B 14, 1577 (1976).
Meera Chandrasekhar, M. H. Grimsditch, and M. Cardona, Phys. Rev. B 18, 4301 (1978); G. W. Gobeli and E. O. Kane, Phys. Rev. Lett. 15, 142 (1965).
A. Compaan, H. W. Lo, M. C. Lee, and A. Aydinli, Phys. Rev. B 26, 1079 (1982).
W. Hayes and R. Loudon, “Scattering of Light by Crystals” (John Wiley, New York, 1978).
Acknowledgment
This research was sponsored by the Division of Materials Sciences, U.S. Department of Energy under Contract No. W-7405-eng-26 with the Union Carbide Corporation.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Jellison, G.E., Wood, R.F. Stress Effects on Raman Measurements of Pulsed Laser Annealed Silicon. MRS Online Proceedings Library 23, 153–158 (1983). https://doi.org/10.1557/PROC-23-153
Published:
Issue Date:
DOI: https://doi.org/10.1557/PROC-23-153