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Epitaxial Growth Of Nickel and Cobalt Germanides On Germanium

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Abstract

Transmission and scanning electron microscopy, Rutherford backscattering-channeling and Read camera glancing angle x-ray diffraction techniques have been applied to study the epitaxial growth of nickel and cobalt germanides on germanium.

NiGe, Co5Ge7 and CoGe2 were found to grow epitaxially on both (001) and (111)Ge. More extensive epitaxy on (111)Ge is correlated with better lattice matches at the germanide/Ge interfaces than those on (001)Ge for these epitaxial germanides.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China

    Y. F. Hsieh & L. J. Chen

  2. Department of Electrical Engineering and Computer Science, University of California, 92093, San Diego, La Jolla, CA, USA

    E. D. Marshall & S. S. Lau

Authors
  1. Y. F. Hsieh
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  2. L. J. Chen
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  3. E. D. Marshall
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  4. S. S. Lau
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Hsieh, Y.F., Chen, L.J., Marshall, E.D. et al. Epitaxial Growth Of Nickel and Cobalt Germanides On Germanium. MRS Online Proceedings Library 91, 467–472 (1987). https://doi.org/10.1557/PROC-91-467

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  • DOI: https://doi.org/10.1557/PROC-91-467

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