Abstract
We report on growth, doping, and characterization studies of GaN films produced by the Electron Cyclotron Resonance microwave plasma assisted Molecular Beam Epitaxy. The films were grown heteroepitaxially on sapphire (0001), whose surface was converted into atomically smooth AIN by plasma nitridation. The GaN films were grown in two temperature steps, a process found to promote the layer-by-layer growth mode. ECR plasma conditions to grow either n-type autodoped or semi-insulating GaN film were identified. The structure and microstructure as well as the electrical properties of these two classes of films are discussed. A systematic dependence between electron mobility and net carrier concentration was found, which predicts that the mobility of GaN with a net carrier concentration of 1014cm-3 is about 104cm2/V.s. The insulating films were intentionally doped either p-type or n-type by incorporation of Mg or Si during film growth. Hole or electron concentrations at 300K between 1018-1019cm-3 have been obtained without requiring any post-growth treatment.
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References
Refractory Semiconductor Materials, edited by N.A. Garjunaova and D.N. Nasledov (Consultant Bureau, New York, 1966)
Wide Band-Gap Semiconductors, Mat. Res. Soc. Symp. Proc, Vol. 242, edited by T.D. Moustakas, J.I. Pankove, and Y. Hamakura (1992).
J.I. Pankove, Mat. Res. Soc. Proc, Vol. 162, 516 (1990)
R.F. Davis, Proc. of the IEEE, 79, 702 (1991)
H. Amano, N. Sawaki, I. Akasaki, and Y. Toyoda, Appl. Phys. Lett., 48, 353 (1986)
H. Amano, I. Akasaki, H. Hiramatsu, N. Koide, and N. Sawaki, Thin Solid Films, 163, 415 (1988)
J. Akasaki and H. Amano, reference 2, p. 383
M. Asif Khan, J.N. Kuznia, J.M. Van Hove, D.T. Olson, S. Krishnankutty, R.M. Kolba, Appl. Phys. Lett., 58, 526 (1991)
G. Menon, Master Thesis, Boston University (1990); G. Menon, R. Molnar, S.J. Berkowitz, and T.D. Moustakas, Bull. APS 36, 544 (1991)
T. Lei, M. Fanciulli, R.J. Molnar, T.D. Moustakas, R.J. Graham, and J. Scanlon, Appl. Phys. Lett., 59, 944 (1991)
T. Lei, T.D. Moustakas, R.J. Graham, T. He, and S.R. Berkowitz, J. Appl. Phys., 71, 4933 (1992)
S. Nakamura, Jpn. J. Appl. Phys. 30, L1705 (1991)
M.J. Paisley, Z. Sitar, J.B. Posthill, and R.F. Davis, J. Vac. Sci. and Technol., A7, 701 (1989)
G. Martin, S. Strite, J. Thornston, and H. Morkoc, Appl. Phys. Lett., 58, 2375 (1991)
R.C. Powell, G.A. Tomasch, Y.W. Kim, J.A. Thornton and J.E. Greene, MRS Symp. Proc. 162, 525 (1990)
H.P. Maruska and J.J. Tietjen, Appl. Phys. Lett. 15, 327 (1969)
H.M. Manasevit, F.M. Erdmann, and W.I. Simpson, J. Electochem. Soc. 118, 1864 (1971)
S. Yoshida, S. Misawa, Y. Fujii, S. Tanaka, S. Hayakawa, S. Gonda, and A. Itoh, J. Vac. Sci. Technol., 16, 990 (1979)
J.I. Pankove, J.E. Berkeyheiser and E.A. Miller, J. Appl. Phys., 45 1280 (1974)
S. Nakamura, T. Mukai, and M. Senoh, Jpn. J. Appl. Phys. L1998 (1991)
C.R. Eddy Jr, T.D. Moustakas, and J. Scanlon, J. Appl. Phys. 73 (Jan. 1993)
T.D. Moustakas, R.J. Molnar, T. Lei, G. Menon, and C.R. Eddy Jr, Reference 2, p 427.
T.D. Moustakas, T. Lei, and R.J. Molnar, Physica B; Condensed Matter (1993)
T. Lei and T.D. Moustakas, Reference 2, p. 433
T. Lei, K.F. Ludwig, and T.D. Moustakas, J. Appl. Phys. (submitted for publication)
T. Sasaki and S. Zembutsu, J. Appl. Phys. 61, 2533 (1987)
R.J. Molnar, T. Lei, and T.D. Moustakas, Appl. Phys. Lett. 62 (Jan. 1993).
R.J. Molnar, T. Lei, and T.D. Moustakas (this volume)
M. Ilegems, J. Cryst. Growth 13/14, 360 (1972)
S. Nakamura, T. Mukai, and M. Senoh, J. Appl. Phys. 71, 5543 (1992)
S. Nakamura, M. Senoh, and T. Makai, Jpn. J. Appl. Phys., L1708 (1992)
R.J. Molnar and T.D. Moustakas, Appl. Phys. Lett. (submitted for publication)
I. Akasaki, H. Amano, N. Koide, M. Kotaki, and K. Mannabe (to be published)
N.F. Mott, T.D. Twose, Advances in Physics 10, 107 (1961)
N.B. Hannay, Semiconductors (Reinhold Publishing Corp., New York, 1960)
S. Nakamura, N. Iwasa, M. Senoh, and T. Mukai, Jpn. J. Appl. Phys., 31 (1992)
Acknowledgements
This work was supported by the office of Naval Research (grant number N0014-92-j-1436). We are grateful to Karl Ludwig for collaboration in XRD, and to Max Yoder for discussions and encouragement.
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Moustakas, T.D., Molnar, R.J. Growth and Doping of GaN Films by ECR-Assisted MBE. MRS Online Proceedings Library 281, 753–763 (1992). https://doi.org/10.1557/PROC-281-753
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DOI: https://doi.org/10.1557/PROC-281-753