Abstract
In order to improve the efficiency of the amorphous silicon stacked solar cells, we have developed the preparation method of highly conductive very thin microcrystalline silicon n-layers. We have found that the addition of a small amount of Ar gas to deposition gases is effective to make microcrystallite size small. The obtained thin films were characterized by conductivity measurement, R-HEED observation and TEM observation.
This newly developed thin microcrystalline n-layers have been applied to the stacked solar cells. Increase of Jsc by 5-6% has been achieved because of the reduction of light absorption loss in n-layer without decrease of Voc and FF.
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Nakabeppu, F., Ishimura, T., Kumagai, K. et al. Development of the Very thin Microcrystalline N-Layer and its Application to the Stacked Solar Cell. MRS Online Proceedings Library 164, 389–393 (1989). https://doi.org/10.1557/PROC-164-389
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DOI: https://doi.org/10.1557/PROC-164-389