Skip to main content
Log in

Boron diffusion into diamond under electric bias

  • Articles
  • Published:
Journal of Materials Research Aims and scope Submit manuscript

Abstract

Three natural type IIa diamond crystals were used for forced diffusion of boron. The diffusion was performed under bias otherwise with the same conditions. The boron diffusion coefficient in diamond was found to be 8.4 × 10–15 and 4 × 10–14 cm2/s at 1000 °C, depending on the direction of the electric field. The drift velocity of boron in diamond under 850 V at 1000 °C was found to be about 1.2 × 10–8 cm/s.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. S. M. Sze, Physics of Semiconductor Devices (John Wiley & Sons, New York, 1981), pp. 7–61.

    Google Scholar 

  2. G. Popovici, T. Sung, S. K. Khasawinah, M. A. Prelas, and R. G. Wilson, J. Appl. Phys. 77, 5625 (1995).

    Article  CAS  Google Scholar 

  3. G. Popovici, T. Sung, M. A. Prelas, and R. G. Wilson, Diamond Materials IV, edited by K. V. Ravi and J. P. Dismukes (Electrochemical Soc., Pennington, NJ, 1995), Vol 95–44, pp. 297–302.

    Google Scholar 

  4. B. I. Boltaks, Diffusion in Semiconductors, edited by H. J. Goldsmid (Academic Press, New York, 1963), pp. 93–128.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Sung, T., Popovici, G., Prelas, M.A. et al. Boron diffusion into diamond under electric bias. Journal of Materials Research 12, 1169–1171 (1997). https://doi.org/10.1557/JMR.1997.0161

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/JMR.1997.0161

Navigation