Abstract
Diamond was deposited on Si(100) substrates by the microwave plasma-assisted chemical vapor deposition method in three steps: carburization, biasing, and growth. High-resolution transmission electron microscopy in cross-sectional view has been used to observe the evolution of microstructures around the interfacial region between diamond and Si in each processing step. The chemistry near the interface was characterized with elemental mapping using an energy-filtered imaging technique with electron energy loss spectroscopy. An amorphous carbon layer, β-SiC and diamond particles, and graphite plates have been observed in the carburization stage. β-SiC can form in epitaxial orientation with Si in the following stage of biasing. Graphite and amorphous carbon were not observed after the bias was applied. Diamond grains were aligned in a strongly textured condition in the growth stage. It has been found that diamond, SiC, and Si all have (111) planes in parallel. The relation of the evolution of microstructure with the processing conditions is also discussed.
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References
W. A. Yarbrough and R. Messier, Science 247, 688 (1990).
S. Yugo, T. Kanai, T. Kimura, and T. Muto, Appl. Phys. Lett. 58, 1036 (1991).
B. R. Stoner and J. T. Glass, Appl. Phys. Lett. 60, 698 (1992).
X. Jiang and C-P. Klages, Diamond Relat. Mater. 2, 1112 (1993).
X. Jiang, C-P. Klages, R. Zachai, M. Hartweg, and H. J. Fusser, Appl. Phys. Lett. 62, 3438 (1993).
X. Jiang, K. Schiffmann, A. Westphal, and C. P. Klages, Appl. Phys. Lett. 63, 1203 (1993).
M. Schreck, R. Hessmer, S. Geier, B. Rauschenbach, and B. Stritzker, Diamond Relat. Mater. 3, 510 (1994).
S. D. Wolter, B. R. Stoner, J. T. Glass, P. J. Ellis, D. S. Buhaenko, C. E. Jenkins, and P. Southworth, Appl. Phys. Lett. 62, 1215–1217 (1993).
B. R. Stoner, S. R. Sahaida, J. P. Bade, P. Southworth, and P. J. Ellis, J. Mater. Res. 8, 1334 (1993).
A. Berger and H. Kohl, Microsc. Microanal. Microstruct. 3, 159 (1992).
R. F. Egerton, Electron Energy-Loss Spectroscopy in the Electron Microscope (Plenum Press, New York, 1986), p. 335.
B. E. Williams and J. T. Glass, J. Mater. Res. 4, 373 (1989).
L. Chang, in Novel Forms of Carbon, edited by C. L. Renschler, J. J. Pouch, and D. M. Cox (Mater. Res. Soc. Symp. Proc. 270, Pittsburgh, PA, 1992), p. 353.
Y. Shigesato, R. E. Boekenhauer, and B. W. Sheldon, Appl. Phys. Lett. 63, 314 (1993).
S. Yugo, T. Kanai, and T. Kimura, Diamond Relat. Mater. 1, 388 (1992).
B. R. Stoner, G-H. M. Ma, S. D. Wolter, W. Zhu, Y. C. Wang, R. F. Davis, and J. T. Glass, Diamond Relat. Mater. 2, 142 (1993).
S. R. Nutt, D. J. Smith, H. J. Kim, and R. F. Davis, Appl. Phys. Lett. 50, 203 (1987).
B. R. Stoner, G-H. M. Ma, S. D. Wolter, and J. T. Glass, Phys. Rev. B 45, 11067 (1992).
C. J. Chen, L. Chang, T. S. Lin, and F. R. Chen, unpublished.
Y. Tzou, J. Bruley, F. Ernst, M. Rühle, and R. Raj, J. Mater. Res. 9, 1566 (1994).
A. van der Drift, Philips Res. Rep. 22, 267 (1967).
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Chen, C.J., Chang, L., Lin, T.S. et al. Microstructural evolution of diamond/Si(100) interfaces with pretreatments in chemical vapor deposition. Journal of Materials Research 10, 3041–3049 (1995). https://doi.org/10.1557/JMR.1995.3041
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DOI: https://doi.org/10.1557/JMR.1995.3041