Abstract
Amorphous carbon films have been deposited on silicon 〈111〉 and quartz substrates by pulsed ruby laser vaporization from pyrolytic graphite. Depositions have been carried out at different substrate temperatures, and the properties of the deposited carbon films have been studied using IR and UV–VIS transmission, ellipsometry, and laser-Raman spectroscopies. Chemical and electrical resistivity measurements have also been performed. It is shown that the film properties depend critically on the substrate temperature and that at the substrate temperature of 50 °C films with substantial proportion of sp 3 hybridized orbitals are obtained.
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Malshe, A.P., Chaudhari, S.M., Kanetkar, S.M. et al. Properties of carbon films deposited by pulsed laser vaporization from pyrolytic graphite. Journal of Materials Research 4, 1238–1242 (1989). https://doi.org/10.1557/JMR.1989.1238
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DOI: https://doi.org/10.1557/JMR.1989.1238