Abstract
The partial pressures of the gas species 
, 
, 
, 
, and H2 in equilibrium with Ge solid have been calculated in the temperature range 400°–1223°K at chlorine to hydrogen ratios ranging from 10−4 to 10. The theoretical efficiency for the deposition of germanium as applied to an open tube epitaxial system is discussed. Comparisons are made to the Si‐H‐Cl system.