Thermal Resistivity Changes in Electron-Irradiated Pyrolytic Graphite

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Copyright (c) 1975 The Japan Society of Applied Physics
, , Citation Takeshi Nihira and Tadao Iwata 1975 Jpn. J. Appl. Phys. 14 1099 DOI 10.1143/JJAP.14.1099

1347-4065/14/8/1099

Abstract

Changes in the a-axis and the c-axis thermal resistivity of pyrolytic graphite caused by electron irradiation at 82 K and by subsequent isochronal pulse annealing have been measured. The additive thermal resistivity at 78.5 K increases as 9.6×102N0.85f and (7.9±0.6)×103N0.75f cm deg/W in the a-axis and the c-axis directions, respectively, in the region of 2 ppm<Nf<70 ppm, where Nf is the concentration of nearly isolated Frenkel defects produced by irradiation. Annealing of the additive thermal resistivity occurs around 100 K and above about 220 K. The characteristics of annealing stages are different in some important respects from those obtained by Goggin and Reynolds. It is inferred that most interstitials do not recombine with vacancies below about 220 K.

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10.1143/JJAP.14.1099