Effects of Ultrathin Al Layer Insertion on Resistive Switching Performance in an Amorphous Aluminum Oxide Resistive Memory

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Published 20 August 2010 ©2010 The Japan Society of Applied Physics
, , Citation Jaehoon Song et al 2010 Appl. Phys. Express 3 091101 DOI 10.1143/APEX.3.091101

1882-0786/3/9/091101

Abstract

We prepared resistive switching Al–AlOx multilayered junctions and observed considerably improved endurance properties. The mechanism of the observed resistance switching basically reflects the filament model. The temperature dependence of the transport in each resistance state revealed additional features, that is a well-defined thermal activation behavior in the high-resistance state is not observed in the layered device and the metallic conduction in the low-resistance state is not affected. The improved endurance properties are discussed in terms of the increased effective number of active regions, where the Reset and Set processes probably occur before a permanent dielectric breakdown.

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10.1143/APEX.3.091101