Fabrication of TiO2-Based Transparent Conducting Oxide Films on Glass by Pulsed Laser Deposition

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Published 12 January 2007 Copyright (c) 2007 The Japan Society of Applied Physics
, , Citation Taro Hitosugi et al 2007 Jpn. J. Appl. Phys. 46 L86 DOI 10.1143/JJAP.46.L86

1347-4065/46/1L/L86

Abstract

Nb-doped anatase TiO2 (Ti0.94Nb0.06O2) films with excellent conductivity and transparency were deposited on non-alkali glass by pulsed laser deposition. X-ray diffraction analysis and transmission electron microscopy confirmed that the obtained films were polycrystalline with anatase structure. The films deposited at a substrate temperature of 250 °C with subsequent H2 annealing at 500 °C showed a resistivity of 1.5 ×10-3 Ω·cm at room temperature and an optical transmittance of 60–80% in the visible region. These results indicate that anatase Ti0.94Nb0.06O2 has great potential as a transparent conducting oxide that could replace Sn-doped In2O3 (ITO).

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