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Fabrication of Nanogap Electrodes Using Ultrathin Metal Film

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Published 1 June 2003 Copyright (c) 2003 The Japan Society of Applied Physics
, , Citation Takashi Miyazaki et al 2003 Jpn. J. Appl. Phys. 42 4173 DOI 10.1143/JJAP.42.4173

1347-4065/42/6S/4173

Abstract

We fabricated a trench structure on an ultrathin, flat Pt film by a scratching technique using an atomic force microscope (AFM) tip. Precise control of the loading force of the tip during the scratching process made it possible to fabricate a fine trench structure without Pt debris on both sides of the trench. Nanogap electrodes were made by this method. Their electrical isolation was confirmed by Kelvin-probe force microscopy (KFM) measurements. Furthermore, we evaporated methylquinquethiophen (M5T) molecules onto the nanogap electrodes and measured the current-to-voltage (I-V) characteristics of the M5T film. We demonstrated that electrical measurements by KFM, utilizing ultrathin Pt nanogap electrodes, was a very attractive method of investigating the local properties of organic molecular films.

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10.1143/JJAP.42.4173