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Room-Temperature 1.54 µm Light Emission from Er,O-Codoped GaAs/GaInP Light-Emitting Diodes Grown by Low-Pressure Organometallic Vapor Phase Epitaxy

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Published 1 April 2003 Copyright (c) 2003 The Japan Society of Applied Physics
, , Citation Atsushi Koizumi et al 2003 Jpn. J. Appl. Phys. 42 2223 DOI 10.1143/JJAP.42.2223

1347-4065/42/4S/2223

Abstract

We report on room-temperature 1.54 µm electroluminescence, for the first time, of Er,O-codoped GaAs/GaInP double-heterostructure light emitting diodes grown by organometallic vapor phase epitaxy. The luminescence is due to intra-4f shell transition from the first excited state to the ground state of Er3+ ions. The erbium and oxygen were uniformly doped in the GaAs active layer with a concentration of 8 ×1018 cm-3. Emission lines in the spectrum indicated successful formation of the Er-2O center and a preferential excitation of the center by current injection. The intensity of the main line observed at 1.538 µm increased linearly with current density and exhibited a tendency to saturate at a current density higher than 20 A/cm2.

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10.1143/JJAP.42.2223