Switching Kinetics of Pb(Zr, Ti)O3 Thin Films Grown by Chemical Vapor Deposition

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Copyright (c) 1993 The Japan Society of Applied Physics
, , Citation Takuma Katayama et al 1993 Jpn. J. Appl. Phys. 32 3943 DOI 10.1143/JJAP.32.3943

1347-4065/32/9R/3943

Abstract

The pulse switching kinetics of ferroelectric Pb(Zr, Ti)O3 thin films grown by chemical vapor deposition (CVD) has been investigated. The switching time was proven to be proportional to the electrode area of the thin-film capacitor under our measurement conditions. Polarization switching was also characterized by the exponential functions of reciprocal voltage. On the basis of the experimental results, the relationships among the apparent switching phenomena, the nucleation process of reversed domains and the time constant of the measurement system are discussed. Moreover, the switching time determined by the low nucleation rate is formulated.

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10.1143/JJAP.32.3943