Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates

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Copyright (c) 1988 The Japan Society of Applied Physics
, , Citation Tadatsugu Minami et al 1988 Jpn. J. Appl. Phys. 27 L287 DOI 10.1143/JJAP.27.L287

1347-4065/27/3A/L287

Abstract

Highly conducting and transparent thin films of undoped tin oxide (SnO2) are prepared on unheated substrates (≦90°C) by rf magnetron sputtering under an applied external dc magnetic field. The lowest resistivity obtained is 1.9×10-3 Ωcm. The SnO2 films with a sheet resistance below 200 Ω/sq and an average visible transmittance (between 400 and 700 nm) above 85%, and below 300 Ω/sq above 80% (including organic film substrate) can be obtained for the films deposited on glass substrates and organic film substrates, respectively.

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10.1143/JJAP.27.L287