Paper
16 February 2011 Narrow-linewidth distributed feedback lasers with laterally coupled ridge-waveguide surface gratings fabricated using nanoimprint lithography
M. Dumitrescu, J. Telkkälä, J. Karinen, J. Viheriälä, A. Laakso, K. Haring, M.-R. Viljanen, J. Paajaste, R. Koskinen, S. Suomalainen, J. Lyytikäinen, T. Leinonen, M. Pessa
Author Affiliations +
Proceedings Volume 7953, Novel In-Plane Semiconductor Lasers X; 79530B (2011) https://doi.org/10.1117/12.875317
Event: SPIE OPTO, 2011, San Francisco, California, United States
Abstract
The conventional distributed feedback (DFB) edge-emitting lasers with buried gratings require two or more epitaxial growth steps. To avoid the problematic overgrowth we have used laterally-corrugated ridge-waveguide surface gratings, which also enable easy integration of the resulting laterally-coupled DFB (LC-DFB) lasers with other devices and are applicable to different materials, including Al-containing ones. The paper presents the modeling and design particularities of LC-DFB lasers, the fabrication process, involving a highly productive and cost-effective UVnanoimprint lithography technique, and the characteristics obtained for the LC-DFB lasers fabricated from GaAs-, GaSband InP-based epiwafers. The first batches of GaAs-based LC-DFB lasers, emitting at 894 nm, GaSb-based LC-DFB lasers emitting at 1.946 μm and InP-based LC-DFB lasers, emitting at 1.55 μm had relatively low threshold currents, a high side-mode-suppression-ratio and exhibited linewidths in the range of 1 MHz and below, showing that the LC-DFB lasers are an effective low-cost alternative for the conventional buried-grating DFB lasers.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Dumitrescu, J. Telkkälä, J. Karinen, J. Viheriälä, A. Laakso, K. Haring, M.-R. Viljanen, J. Paajaste, R. Koskinen, S. Suomalainen, J. Lyytikäinen, T. Leinonen, and M. Pessa "Narrow-linewidth distributed feedback lasers with laterally coupled ridge-waveguide surface gratings fabricated using nanoimprint lithography", Proc. SPIE 7953, Novel In-Plane Semiconductor Lasers X, 79530B (16 February 2011); https://doi.org/10.1117/12.875317
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KEYWORDS
Laser development

Mirrors

Refractive index

Etching

Nanoimprint lithography

Laser damage threshold

Laser applications

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