Selective removal of persistent particles with no photomask damage

Tod Robinson; Ron Bozak; Roy White; Mike Archuletta; David Lee

doi:10.1117/12.824296

11 May 2009 Selective removal of persistent particles with no photomask damage

Tod Robinson, Ron Bozak, Roy White, Mike Archuletta, David Lee

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73791J (2009) https://doi.org/10.1117/12.824296
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

Makers and users of advanced technology photomasks have seen increased difficulties with the removal of persistent, or stubborn, nano-particle contamination. Shrinking pattern geometries, and new mask clean technologies to minimize haze, have both increased the number of problems and loss of mask yield due to these non-removable nano-particles. A novel technique (BitClean^TM) has been developed using a scanning probe microscope system originally designed for nanomachining photomask defect repair. Progress in the technical development of this approach into a manufacture-able solution is reviewed and its effectiveness is shown in selectively removing adherent particles without touching surrounding sensitive structures. Methods for generating targeted edge test particles along with considerations for removal of particles in various pattern geometries and materials are also discussed.

Citation Download Citation

Tod Robinson, Ron Bozak, Roy White, Mike Archuletta, and David Lee "Selective removal of persistent particles with no photomask damage", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791J (11 May 2009); https://doi.org/10.1117/12.824296

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