Nanometer-scale lithography with chromium and helium atoms

Thomas Schulze; Ulrich Drodofsky; B. Brezger; J. Stuhler; S. Nowak; Tilman Pfau; Juergen Mlynek

doi:10.1117/12.273774

1 May 1997 Nanometer-scale lithography with chromium and helium atoms

Thomas Schulze, Ulrich Drodofsky, B. Brezger, J. Stuhler, S. Nowak, Tilman Pfau, Juergen Mlynek

Proceedings Volume 2995, Atom Optics; (1997) https://doi.org/10.1117/12.273774
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

We describe two experiments that use neutral atomic beam techniques to write nanostructures. In the chromium experiment we have used neutral chromium atoms to write periodic nanometerscale structures in a direct way. In a second experiment we have used a self-assembling monolayer as a resist for metastable helium atoms.

Citation Download Citation

Thomas Schulze, Ulrich Drodofsky, B. Brezger, J. Stuhler, S. Nowak, Tilman Pfau, and Juergen Mlynek "Nanometer-scale lithography with chromium and helium atoms", Proc. SPIE 2995, Atom Optics, (1 May 1997); https://doi.org/10.1117/12.273774

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