Characterization of Si3N4/SiO2 optical channel waveguides by photon scanning tunneling microscopy

Yan Wang; Mona H. Chudgar; Howard E. Jackson; Jeffrey S. Miller; Gregory N. De Brabander; Joseph T. Boyd

doi:10.1117/12.141222

2 March 1993 Characterization of Si₃N₄/SiO₂ optical channel waveguides by photon scanning tunneling microscopy

Yan Wang, Mona H. Chudgar, Howard E. Jackson, Jeffrey S. Miller, Gregory N. De Brabander, Joseph T. Boyd

Proceedings Volume 1793, Integrated Optics and Microstructures; (1993) https://doi.org/10.1117/12.141222
Event: Fibers '92, 1992, Boston, MA, United States

Abstract

Photon scanning tunneling microscopy (PSTM) is used to characterize Si3N4/Si02 optical channel waveguides being used for integrated optical-micromechanical sensors. PSTM utilizes an optical fiber tapered to a fine point which is piezoelectrically positioned to measure the decay of the evanescent field intensity associated with the waveguide propagating mode. Evanescent field decays are recorded for both ridge channel waveguides and planar waveguide regions. Values for the local effective refractive index are calculated from the data for both polarizations and compared to model calculations.

Citation Download Citation

Yan Wang, Mona H. Chudgar, Howard E. Jackson, Jeffrey S. Miller, Gregory N. De Brabander, and Joseph T. Boyd "Characterization of Si₃N₄/SiO₂ optical channel waveguides by photon scanning tunneling microscopy", Proc. SPIE 1793, Integrated Optics and Microstructures, (2 March 1993); https://doi.org/10.1117/12.141222

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