Band Gap and Electronic Structure of an Epitaxial, Semiconducting Cr0.80Al0.20 Thin Film

Z. Boekelheide, A. X. Gray, C. Papp, B. Balke, D. A. Stewart, S. Ueda, K. Kobayashi, F. Hellman, and C. S. Fadley
Phys. Rev. Lett. 105, 236404 – Published 3 December 2010

Abstract

Cr1xAlx exhibits semiconducting behavior for x=0.150.26. This Letter uses hard x-ray photoemission spectroscopy and density functional theory to further understand the semiconducting behavior. Photoemission measurements of an epitaxial Cr0.80Al0.20 thin film show several features in the valence band region, including a gap at the Fermi energy (EF) for which the valence band edge is 95±14meV below EF. Theory agrees well with the valence band measurements, and shows an incomplete gap at EF due to the hole band at M shifting almost below EF.

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  • Received 22 August 2010

DOI:https://doi.org/10.1103/PhysRevLett.105.236404

© 2010 The American Physical Society

Authors & Affiliations

Z. Boekelheide1,2,*, A. X. Gray3,2, C. Papp4,2, B. Balke5,2, D. A. Stewart6, S. Ueda7, K. Kobayashi7, F. Hellman1,2, and C. S. Fadley3,2

  • 1Department of Physics, University of California, Berkeley, Berkeley, California 94720, USA
  • 2Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 3Department of Physics, University of California, Davis, Davis, California 95616, USA
  • 4Lehrstuhl für Physikalische Chemie II, Universität Erlangen-Nürnberg, Egerlandstr. 3, 91058 Erlangen, Germany
  • 5Institut für Anorganische und Analytische Chemie Johannes Gutenberg Universität, 55099 Mainz, Germany
  • 6Cornell Nanoscale Facility, Cornell University, Ithaca, New York 14853 USA
  • 7NIMS Beamline Station at SPring-8, National Institute for Materials Science, Hyogo 678-5148, Japan

  • *zboekelheide@berkeley.edu

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Vol. 105, Iss. 23 — 3 December 2010

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