Controllable healing of defects and nitrogen doping of graphene by CO and NO molecules

B. Wang and S. T. Pantelides
Phys. Rev. B 83, 245403 – Published 17 June 2011
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Abstract

Controllable defect healing and N-doping in graphene would be very valuable for potential device applications. Here we report first-principles molecular-dynamics simulations that suggest a procedure with fast dynamics and low thermal budget. Vacancies can be healed by sequential exposure to CO and NO molecules. A CO molecule gets adsorbed at a vacancy site and a NO molecule subsequently removes the extra O by forming NO2. Controllable N-doping can be achieved by sequential vacancy creation (e.g., by an electron beam) and subsequent exposure to NO molecules at room temperature. A combination of CO and NO molecules can potentially provide simultaneous healing and doping at a desirable ratio. The proposed strategy introduces no extra defects and is promising for graphene-based materials in radiation environments.

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  • Received 2 May 2011

DOI:https://doi.org/10.1103/PhysRevB.83.245403

©2011 American Physical Society

Authors & Affiliations

B. Wang1,* and S. T. Pantelides1,2,3

  • 1Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235, USA
  • 2Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, Tennessee 37235, USA
  • 3Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA

  • *bin.wang@vanderbilt.edu

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Issue

Vol. 83, Iss. 24 — 15 June 2011

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