Observation and model of highly ordered wavy cracks due to coupling of in-plane stress and interface debonding in silica thin films

Neng Wan (万能), Jun Xu (徐骏), Tao Lin (林涛), Ling Xu (徐岭), and Kunji Chen (陈坤基)
Phys. Rev. B 80, 014121 – Published 31 July 2009

Abstract

Highly ordered wavy cracks are observed in silica films deposited on crystalline Si wafer. The wavy crack path is interpreted in terms of the coupling of the in-plane film crack and the interface debonding. A model based on the analyzing of the crack path and the stress evolution is proposed to describe the propagation of the wavy cracks. A scaling relationship between the wavelength (λ) and amplitude (A) is found (λAξ) and the scaling factor is determined to be ξ=0.47±0.01.

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  • Received 23 January 2009

DOI:https://doi.org/10.1103/PhysRevB.80.014121

©2009 American Physical Society

Authors & Affiliations

Neng Wan (万能), Jun Xu (徐骏)*, Tao Lin (林涛), Ling Xu (徐岭), and Kunji Chen (陈坤基)

  • Department of Physics and Nanjing National Laboratory of Microstructures, Nanjing University, Nanjing 210093, People’s Republic of China

  • *Corresponding author; junxu@nju.edu.cn

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Issue

Vol. 80, Iss. 1 — 1 July 2009

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