Smooth monolayer As- and Ga-terminated GaAs(100) surfaces

M.-H. Tsai, C. F. Liu, and C. S. Chang
Phys. Rev. B 54, 7637 – Published 15 September 1996
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Abstract

Recent layer-by-layer migration enhanced epitaxy growth of high quality GaAs(100) films at low temperatures suggested that smooth missing-dimer-free monolayer As- and Ga-terminated surfaces are attainable during the growth process or the grown films will contain a high concentration of antisite defects. Using the local-orbital density-functional molecular-dynamics method, we find that the smooth monolayer As-terminated surface may be the (2×4) surface with a three-dimer unit and a shifted dimer. The smooth monolayer Ga-terminated surface may be the (1×2) dimerized surface. © 1996 The American Physical Society.

  • Received 23 May 1996

DOI:https://doi.org/10.1103/PhysRevB.54.7637

©1996 American Physical Society

Authors & Affiliations

M.-H. Tsai and C. F. Liu

  • Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan 80424, Republic of China

C. S. Chang

  • Institute of Physics, Academia Sinica, Nankang, Taipei, Taiwan 11529, Republic of China

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Vol. 54, Iss. 11 — 15 September 1996

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