Al-√3 × √3 domain structure on Si(111)-7×7 observed by scanning tunneling microscopy

Katsuya Takaoka, Masamichi Yoshimura, Takafumi Yao, Tomoshige Sato, Takashi Sueyoshi, and Masashi Iwatsuki
Phys. Rev. B 48, 5657 – Published 15 August 1993
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Abstract

Scanning tunneling microscopy is used to study the structure of Al-√3 × √3 domains on the Si(111)-7×7 surface and the atomic arrangement around the domain boundary. Al-√3 × √3 domains grow from kink sites of the 〈110〉 or 〈211〉 step and extend over the Si-7×7 terrace. Detailed investigation around the boundaries reveals that faulted sites face the boundaries on the Si-7×7 side, while on the Al-√3 × √3 side, Al adatoms occupy the T4 sites except on the rows adjacent to the phase boundaries where Al (or Si) atoms are adsorbed on the Si adatom sites. The latter atoms play an important role in retaining the dimer structure at the boundaries.

  • Received 11 May 1993

DOI:https://doi.org/10.1103/PhysRevB.48.5657

©1993 American Physical Society

Authors & Affiliations

Katsuya Takaoka, Masamichi Yoshimura, and Takafumi Yao

  • Department of Electrical Engineering, Hiroshima University, Kagamiyama, Higashi-hiroshima 724, Japan

Tomoshige Sato, Takashi Sueyoshi, and Masashi Iwatsuki

  • JEOL Ltd., Akishima, Tokyo 196, Japan

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Issue

Vol. 48, Iss. 8 — 15 August 1993

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