• Open Access

Contribution of Capillary Adhesion to Friction at Macroscopic Solid–Solid Interfaces

Feng-Chun Hsia, Chao-Chun Hsu, Liang Peng, Fiona M. Elam, Chen Xiao, Steve Franklin, Daniel Bonn, and Bart Weber
Phys. Rev. Applied 17, 034034 – Published 11 March 2022
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Abstract

Capillary adhesion is commonly present in ambient conditions. It can be measured in single-asperity contacts through atomic force microscopy using a sharp probe that is pulled off a smooth substrate. However, for macroscopic multiasperity interfaces, the measured adhesive force is always close to zero because of the elastic energy stored into the deformation of surface roughness; this is known as the adhesion paradox. Here, we experimentally show how capillary adhesion influences friction between macroscopic Si-on-Si interfaces, covered with native oxide, in two vapor environments: humid air and isopropyl alcohol (IPA) vapor. To quantify the adhesion contribution to friction, we present a boundary element method that successfully models the interplay between capillary adhesion, surface topography, and friction without adjustable parameters and show that the evolution of the surface topography during sliding dramatically increases capillary adhesion and thus friction. Replacing the water vapor with an organic (IPA) vapor, we find a lower adhesion due to the smaller surface tension.

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  • Received 28 October 2021
  • Revised 13 January 2022
  • Accepted 9 February 2022

DOI:https://doi.org/10.1103/PhysRevApplied.17.034034

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

© 2022 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Feng-Chun Hsia1,2, Chao-Chun Hsu3, Liang Peng2, Fiona M. Elam1, Chen Xiao1,2, Steve Franklin1,4, Daniel Bonn2, and Bart Weber1,2,*

  • 1Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098 XG Amsterdam, Netherlands
  • 2Van der Waals-Zeeman Institute, Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
  • 3Van’t Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, Netherlands
  • 4Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD, United Kingdom

  • *b.weber@arcnl.nl

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Vol. 17, Iss. 3 — March 2022

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