Multiple-charged secondary-ion emission from silicon and silicon oxide bombarded by heavy ions at energies of 0.4–10 MeV

S. Kyoh, K. Takakuwa, M. Sakura, M. Umezawa, A. Itoh, and N. Imanishi
Phys. Rev. A 51, 554 – Published 1 January 1995
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Abstract

Secondary-ion yields have been measured for Si and SiO2 targets bombarded by C, Si, Ge, and Ag projectiles over an energy range beween 0.4 and 10 MeV, where the atomic-collision process changes from a nuclear to an electronic one. Obtained yields of secondary Siq+ (q=1,2,3,4) ions for the C projectiles are generally decreasing functions of incident energy. On the other hand, the yields for Ag increase with increasing energy except for Si+. The possibility of multiple-charged recoil-ion production through the simultaneous process of ionization and recoil caused by the projectiles is discussed on the basis of an independent-electron model, which describes multiple ionization of atoms by energetic heavy-ion impact.

  • Received 25 July 1994

DOI:https://doi.org/10.1103/PhysRevA.51.554

©1995 American Physical Society

Authors & Affiliations

S. Kyoh, K. Takakuwa, M. Sakura, M. Umezawa, A. Itoh, and N. Imanishi

  • Department of Nuclear Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-01, Japan

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Vol. 51, Iss. 1 — January 1995

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