Design of Shallow Donor Levels in Diamond by Isovalent-Donor Coupling

D. Segev and Su-Huai Wei
Phys. Rev. Lett. 91, 126406 – Published 19 September 2003

Abstract

Using the first-principles pseudopotential method, we have studied simultaneous isovalent and n-type doping in diamond. We show that Si induces fully occupied isovalent levels near the valence band maximum. The Si levels interact with N donor levels, making them much shallower. The donor transition energy level of the N+4Si defect complexes is found to be 0.09 eV below the conduction band minimum, which is the shallowest level found thus far for this system. The binding energy of the N+4Si complex is also large enough to insure its stability.

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  • Received 17 June 2003

DOI:https://doi.org/10.1103/PhysRevLett.91.126406

©2003 American Physical Society

Authors & Affiliations

D. Segev and Su-Huai Wei

  • National Renewable Energy Laboratory, Golden, Colorado 80401, USA

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Issue

Vol. 91, Iss. 12 — 19 September 2003

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