Nucleation and Growth of Islands on GaAs Surfaces

A. R. Avery, H. T. Dobbs, D. M. Holmes, B. A. Joyce, and D. D. Vvedensky
Phys. Rev. Lett. 79, 3938 – Published 17 November 1997
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Abstract

Submonolayer island-size distributions are obtained with scanning tunneling microscopy and used to infer the nucleation and growth kinetics of islands on the three low-index surfaces of GaAs. Comparison with Monte Carlo simulations reveals that on the (110) and (111)A surfaces, random nucleation is followed by the attachment and detachment of single atoms at island edges. But on the (001) surface (using As4), nucleation is initiated in the trenches of the 2×4 reconstruction by pairs of Ga atoms. Growth then proceeds over locally filled trenches, also by the capture of pairs of Ga atoms.

  • Received 20 June 1997

DOI:https://doi.org/10.1103/PhysRevLett.79.3938

©1997 American Physical Society

Authors & Affiliations

A. R. Avery, H. T. Dobbs, D. M. Holmes, B. A. Joyce, and D. D. Vvedensky

  • Interdisciplinary Research Centre for Semiconductor Materials, Imperial College, London SW7 2BZ, United Kingdom

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Vol. 79, Iss. 20 — 17 November 1997

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