Temperature-Induced Semiconducting c(4×2)Metallic(2×1) Reversible Phase Transition on the β-SiC(100) Surface

V. Yu. Aristov, L. Douillard, O. Fauchoux, and P. Soukiassian
Phys. Rev. Lett. 79, 3700 – Published 10 November 1997
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Abstract

We use combined variable temperature scanning tunneling microscopy and spectroscopy, and angle-resolved photoemission spectroscopy experiments to study transition between two β-SiC(100) surface structures. We observe a reversible temperature-dependent phase transition from a semiconducting c(4×2) surface at 25 °C to a metallic 2×1 structure at 400 °C. This transition results from temperature-induced disruption of the c(4×2) structure composed of alternately up and down dimers into a structure having all dimers at the same height giving a 2×1 symmetry. This arrangement favors electronic orbital overlap between Si top surface atoms leading to surface metallization.

  • Received 27 May 1997

DOI:https://doi.org/10.1103/PhysRevLett.79.3700

©1997 American Physical Society

Authors & Affiliations

V. Yu. Aristov, L. Douillard, O. Fauchoux, and P. Soukiassian

  • Commissariat à l'Energie Atomique, DSM-DRECAM-SRSIM, Bâtiment 462, Centre d'Etudes de Saclay, 91191 Gif sur Yvette Cedex, France
  • and Département de Physique, Université de Paris-Sud, 91405 Orsay Cedex, France

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Vol. 79, Iss. 19 — 10 November 1997

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