Diffusion of Boron in Copper by Direct-Exchange Mechanism

B. Ittermann, H. Ackermann, H.-J. Stöckmann, K.-H. Ergezinger, M. Heemeier, F. Kroll, F. Mai, K. Marbach, D. Peters, and G. Sulzer
Phys. Rev. Lett. 77, 4784 – Published 2 December 1996
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Abstract

The behavior of B impurities implanted into Cu single crystals has been investigated by means of β radiation detected nuclear magnetic resonance and cross-relaxation spectroscopy. Diffusion of substitutional B ( Bs) in Cu is observed in the temperature range of T=600750K. By combining information from new and formerly published data it is shown that this diffusion is not mediated by any other defect; it rather takes place by a direct site exchange between Bs and neighboring Cu atoms. To our knowledge Bs in Cu is the first system for which this long discussed diffusion mechanism has been established experimentally.

  • Received 5 August 1996

DOI:https://doi.org/10.1103/PhysRevLett.77.4784

©1996 American Physical Society

Authors & Affiliations

B. Ittermann, H. Ackermann, H.-J. Stöckmann, K.-H. Ergezinger, M. Heemeier, F. Kroll, F. Mai, K. Marbach, D. Peters, and G. Sulzer

  • Fachbereich Physik der Universität Marburg, D-35032 Marburg, Germany

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Issue

Vol. 77, Iss. 23 — 2 December 1996

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