Complete wetting on ‘‘strong’’ substrates: Xe/Pt(111)

Klaus Kern, Rudolf David, Robert L. Palmer, and George Comsa
Phys. Rev. Lett. 56, 2823 – Published 30 June 1986
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Abstract

The growth of Xe films on Pt(111) has been investigated by elastic and inelastic, high-resolution, thermal-He scattering. Down to 25 K, Xe films grow layer by layer up to at least 25-monolayer films. This enlarges the complete wetting range on the so-called ‘‘scale of substrate strength’’ by a factor of 4. A buckling of the rotated monolayer has been observed for the first time. This demonstrates that the full monolayer is locked on the substrate and suggests that orientational ordering contributes to complete wetting on strongly binding substrates.

  • Received 6 March 1986

DOI:https://doi.org/10.1103/PhysRevLett.56.2823

©1986 American Physical Society

Authors & Affiliations

Klaus Kern, Rudolf David, Robert L. Palmer, and George Comsa

  • Institut für Grenzflachenforschung und Vakuumphysik, Kernforschungsanlage Jülich, D-5170 Jülich, West Germany

Comments & Replies

Comment on "Complete Wetting on `Strong' Substrates: Xe/Pt(111)"

Mirta B. Gordon
Phys. Rev. Lett. 57, 2094 (1986)

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Issue

Vol. 56, Iss. 26 — 30 June 1986

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