Structure of Amorphous (Ge,Si)1xYx Alloys

J. C. Phillips
Phys. Rev. Lett. 42, 1151 – Published 23 April 1979
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Abstract

I propose kinetically determined topological models of lightly doped (x0.05) amorphous (Ge,Si)1xYx alloys (Y=H,F,B,P,). Without adjustable parameters the model relates the lowest concentration xH0 of hydrogen atoms required to quench paramagnetic dangling bonds to the concentration c0 of unpaired spins at x=0. Also discussed are the structural differences between freshly evaporated α-(Ge, Si) and various stages of ion-bombarded ("amorphized") crystalline material.

  • Received 25 January 1979

DOI:https://doi.org/10.1103/PhysRevLett.42.1151

©1979 American Physical Society

Authors & Affiliations

J. C. Phillips

  • Bell Laboratories, Murray Hill, New Jersey 07974

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Issue

Vol. 42, Iss. 17 — 23 April 1979

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