• Open Access

In Situ Probing of Fast Defect Annealing in Cu and Ni with a High-Intensity Positron Beam

Bernd Oberdorfer, Eva-Maria Steyskal, Wolfgang Sprengel, Werner Puff, Philip Pikart, Christoph Hugenschmidt, Michael Zehetbauer, Reinhard Pippan, and Roland Würschum
Phys. Rev. Lett. 105, 146101 – Published 28 September 2010

Abstract

A high-intensity positron beam is used for specific in situ monitoring of thermally activated fast defect annealing in Cu and Ni on a time scale of minutes. The atomistic technique of positron-electron annihilation is combined with macroscopic high-precision length-change measurements under the same thermal conditions. The combination of these two methods as demonstrated in this case study allows for a detailed analysis of multistage defect annealing in solids distinguishing vacancies, dislocations, and grain growth.

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  • Received 19 May 2010

DOI:https://doi.org/10.1103/PhysRevLett.105.146101

This article is available under the terms of the Creative Commons Attribution 3.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

© 2010 The American Physical Society

Authors & Affiliations

Bernd Oberdorfer, Eva-Maria Steyskal, Wolfgang Sprengel*, and Werner Puff

  • Institute of Materials Physics, Graz University of Technology, A-8010 Graz, Austria

Philip Pikart and Christoph Hugenschmidt

  • Physics Department E 21 and FRM II, Technical University Munich, D-85747 Garching, Germany

Michael Zehetbauer

  • Physics of Nanostructured Materials, Faculty of Physics, University of Vienna, A-1090 Vienna, Austria

Reinhard Pippan

  • Erich Schmid Institute of Materials Science, Austrian Academy of Sciences, and Department Materials Physics, University of Leoben, A-8700 Leoben, Austria

Roland Würschum

  • Institute of Materials Physics, Graz University of Technology, A-8010 Graz, Austria

  • *w.sprengel@tugraz.at

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Vol. 105, Iss. 14 — 1 October 2010

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