Measurements of mechanical thermal noise and energy dissipation in optical dielectric coatings

Tianjun Li, Felipe A. Aguilar Sandoval, Mickael Geitner, Ludovic Bellon, Gianpietro Cagnoli, Jérôme Degallaix, Vincent Dolique, Raffaele Flaminio, Danièle Forest, Massimo Granata, Christophe Michel, Nazario Morgado, and Laurent Pinard
Phys. Rev. D 89, 092004 – Published 8 May 2014

Abstract

In recent years, an increasing number of devices and experiments are shown to be limited by mechanical thermal noise. In particular, subhertz laser frequency stabilization and gravitational wave detectors that are able to measure fluctuations of 1018m/Hz or less are being limited by thermal noise in the dielectric coatings deposited on mirrors. In this paper, we present a new measurement of thermal noise in low absorption dielectric coatings deposited on microcantilevers, and we compare it with the results obtained from the mechanical loss measurements. The coating thermal noise is measured on the widest range of frequencies with the highest signal-to-noise ratio ever achieved. In addition, we present a novel technique to deduce the coating mechanical losses from the measurement of the mechanical quality factor which does not rely on the knowledge of the coating and substrate Young’s moduli. The dielectric coatings are deposited by ion beam sputtering. The results presented here give a frequency-independent loss angle of (4.7±0.2)×104 with a Young’s modulus of 118 GPa for annealed tantala from 10 Hz to 20 kHz. For as-deposited silica, a weak frequency dependence (f0.025) is observed in this frequency range, with a Young’s modulus of 70 GPa and an internal damping of (6.0±0.3)×104 at 16 kHz, but this value decreases by one order of magnitude after annealing, and the frequency dependence disappears.

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  • Received 17 December 2013

DOI:https://doi.org/10.1103/PhysRevD.89.092004

© 2014 American Physical Society

Authors & Affiliations

Tianjun Li*

  • Université de Lyon, Laboratoire de physique, ENS Lyon, CNRS, Lyon 69364, France and Department of Physics, East China Normal University 3663 Zhongshan North Road, Shanghai 200062, People’s Republic of China

Felipe A. Aguilar Sandoval, Mickael Geitner, and Ludovic Bellon

  • Université de Lyon, Laboratoire de physique, ENS Lyon, CNRS, Lyon 69364, France

Gianpietro Cagnoli§, Jérôme Degallaix, Vincent Dolique, Raffaele Flaminio, Danièle Forest, Massimo Granata, Christophe Michel, Nazario Morgado, and Laurent Pinard

  • Laboratoire des Matériaux Avancés (LMA), IN2P3/CNRS, Université de Lyon, F-69622 Villeurbanne, Lyon, France

  • *Present address: Physics Department, Shaoxing University, Shaoxing, 312000, People’s Republic of China.
  • Present address: Universidad de Santiago de Chile, Departamento de Fìsica, Avenida Ecuador 3493, Casilla 307, Correo 2, Santiago, Chile.
  • ludovic.bellon@ens-lyon.fr
  • §g.cagnoli@lma.in2p3.fr

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Vol. 89, Iss. 9 — 1 May 2014

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