Graphene/SiC(0001) interface structures induced by Si intercalation and their influence on electronic properties of graphene

Anton Visikovskiy, Shin-ichi Kimoto, Takashi Kajiwara, Masamichi Yoshimura, Takushi Iimori, Fumio Komori, and Satoru Tanaka
Phys. Rev. B 94, 245421 – Published 19 December 2016

Abstract

Epitaxial graphene growth on SiC surfaces is considered advantageous in terms of device application. However, the first graphitic layer on SiC transforms to a buffer layer because of strong coupling with the substrate. The properties of several subsequent layers are also significantly degraded. One method to decouple graphene from the substrate is Si intercalation. In the present work, we report observation and analysis of interface structures formed by Si intercalation in between the graphene layer and the SiC(0001) surface depending on Si coverage and influence of these interfaces on graphene electronic structure by means of low-energy electron diffraction (LEED), scanning tunneling microscopy (STM), angle-resolved photoemission spectroscopy (ARPES), and theoretical first-principles calculations. The STM appearance of observed periodic interface structures strongly resembles previously known Si-rich phases on the SiC(0001) surface. Based on the observed range of interface structures we discuss the mechanism of graphene layer decoupling and differences in stability of the Si-rich phases on clean SiC(0001) and in the graphene/SiC(0001) interface region. We also discuss a possibility to tune graphene electronic properties by interface engineering.

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  • Received 8 April 2016
  • Revised 5 October 2016

DOI:https://doi.org/10.1103/PhysRevB.94.245421

©2016 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Anton Visikovskiy1,*, Shin-ichi Kimoto1, Takashi Kajiwara1, Masamichi Yoshimura2, Takushi Iimori3, Fumio Komori3, and Satoru Tanaka1

  • 1Department of Applied Quantum Physics and Nuclear Engineering, Kyushu University, Fukuoka 819-0395, Japan
  • 2Toyota Technological Institute, Nagoya 468-8511, Japan
  • 3Institute of Solid State Physics, University of Tokyo, Kashiwa 277-8581, Japan

  • *Corresponding author: anton_v@nucl.kyushu-u.ac.jp

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Issue

Vol. 94, Iss. 24 — 15 December 2016

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